C7460 데이터 시트보기 (PDF) - Hamamatsu Photonics

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C7460

Multiband Plasma-Process Monitor

Hamamatsu Photonics 

End-point Synthesis Tool U8851

Optional Software

FEATURES

q End-point detection in small aperture process

q Simultaneous analysis of several wafers

q Stability evaluation of a process

OPERATIONAL OUTLINE

Fig. 2 Analysis pattern

q Measurement data D (λ,t)

D (l, t) = Average spectrum + S1 (l) × T1 (t) + S2 (l)× T2 (t) + S3 (l) × T3 (t)

OUTLINE

The U8851 is an optional software application that is utilized

with the Multiband Plasma-Process Monitor C7460 for end-

point detection in plasma etching.

With the U8851, highly sensitive end-point detection of the

conventionally difficult small aperture process has been

S1 (λ)

T1 (t)

made possible.

In addition, since the process data of several wafers can be

analyzed simultaneously, the reliability of the operation

formula that performs an end-point detection is improved,

the verification of an end-point detection is performed easily,

and the stability evaluation of a process can be performed as

well.

COMPARISON

Conventional method

S2 (λ)

T2 (t)

U8851

S3 (λ)

T3 (t)

End point

Fig. 1 Comparison of U8851 with conventional method

An example of an end-point detection of oxidization film

etching (1% or less of aperture ratio) is shown in Fig. 1.

Although it was difficult to detect the end-point of a process

from the time changes in spectrum intensity by using the

conventional method, detection with sufficient accuracy is

possible with the U8851.

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